neoStampa 26.3.1
Version 26.3.1 of neoStampa introduces improvements focused on the color profiling process and overall application optimization. This update enhances accuracy in color management workflows and improves interface consistency across all supported languages, ensuring a more stable and reliable experience in production environments.
The improvements included in this version are aimed at users who require more precise control during printer re-profiling, as well as those working in multilingual environments who need a clear and consistent interface throughout the application.
Improvements
Allows cutting inner paths when using the cut shape contour for internal shapes.
Saves the separation distance as the default value in the “Tile” option to apply it to newly opened jobs.
A new re-profiling target has been added for i1Pro 3 iO CMYK, allowing more precise recalibration and improving accuracy when creating ICC profiles for professional digital printing workflows.
Translations have been reviewed and improved across the entire application, correcting texts, adjusting technical terminology, and ensuring greater consistency between the different available languages.
General optimization
Internal improvements to increase stability during calibration processes.
Minor fixes in the user interface.
Adjustments to improve visual consistency across different screen resolutions.
